Application:Rhenium sheet is mainly used as electrode materials in high temperature and harsh conditions, for production of electronic components and ultra high temperature heater tube with metal evaporation in semiconductor and electronics industry. The high temperature heating parts need to work under special conditions, compared with other materials, pure rhenium heating has better electrical performance, longer life expectancy, these significant properties are more resistant to harsh working atmosphere and favored by the users. Rhenium foil is mainly used for chemical vapor phase deposition coating and film(CVD) and physical vapor deposition(PVD) procss, including hot electron beam evaporation, low temperature organic evaporation, atomic layer deposition(ALD) and metal organic chemical vapor deposition product(MOCVD) etc. Others can be used for manufacturing special parts in aerospace equipment
Application:High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5 N or 6 N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal. Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers, diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors. Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells.
